SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Experimental validation of stochastic modeling for negative-tone develop EUV resists
Wood, Obert R., Panning, Eric M., Kamohara, Itaru, Gao, Weimin, Klostermann, Ulrich, Schmöller, Thomas, Demmerle, Wolfgang, Lucas, Kevin, De Simone, Danilo, Hendrickx, Eric, Vandenberghe, GeertVolume:
9422
Year:
2015
Language:
english
DOI:
10.1117/12.2085506
File:
PDF, 2.10 MB
english, 2015