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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Cost effective processes by using negative-tone development application
Wallow, Thomas I., Hohle, Christoph K., Yamamoto, Kei, Kato, Keita, Ou, Keiyu, Shirakawa, Michihiro, Kamimura, SouVolume:
9425
Year:
2015
Language:
english
DOI:
10.1117/12.2085745
File:
PDF, 1.48 MB
english, 2015