SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Total fidelity management in self-aligned multiple patterning process
Wallow, Thomas I., Hohle, Christoph K., Yamato, Masatoshi, Okabe, Noriaki, Hara, Arisa, Natori, Sakurako, Yamauchi, Shouhei, Koike, Kyohei, Oyama, Kenichi, Yaegashi, HidetamiVolume:
9425
Year:
2015
Language:
english
DOI:
10.1117/12.2085765
File:
PDF, 915 KB
english, 2015