SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Nanomechanical properties of solvent cast PS and PMMA polymer blends and block co-polymers
Resnick, Douglas J., Bencher, Christopher, Lorenzoni, Matteo, Evangelio, Laura, Nicolet, Célia, Navarro, Christophe, San Paulo, Alvaro, Perez Murano, FrancescVolume:
9423
Year:
2015
Language:
english
DOI:
10.1117/12.2085829
File:
PDF, 763 KB
english, 2015