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SPIE Proceedings [SPIE Photomask Japan 2015 - Yokohama, Japan (Monday 20 April 2015)] Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII - Fabrication of microfluidic paths using thick and vertical resist patterns printed by exposure with intentional large defocus
Yoshioka, Nobuyuki, Morizane, Yuta, Horiuchi, ToshiyukiVolume:
9658
Year:
2015
Language:
english
DOI:
10.1117/12.2192936
File:
PDF, 697 KB
english, 2015