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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Study of design-based e-beam defect inspection for hotspot detection and process window characterization on 10nm logic device
Sanchez, Martha I., Ukraintsev, Vladimir A., Leray, Philippe, Halder, Sandip, Di Lorenzo, Paolo, Wang, Fei, Zhang, Pengcheng, Fang, Wei, Liu, Kevin, Jau, JackVolume:
9778
Year:
2016
Language:
english
DOI:
10.1117/12.2218971
File:
PDF, 563 KB
english, 2016