SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Process monitor of 3D-device features by using FIB and CD-SEM
Sanchez, Martha I., Ukraintsev, Vladimir A., Kawada, Hiroki, Sakai, Hideo, Ikota, Masami, Torikawa, Shota, Tomimatsu, Satoshi, Onishi, TsuyoshiVolume:
9778
Year:
2016
Language:
english
DOI:
10.1117/12.2218997
File:
PDF, 1.74 MB
english, 2016