SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Process window limiting hot spot monitoring for high-volume manufacturing
Sanchez, Martha I., Ukraintsev, Vladimir A., Jochemsen, Marinus, Anunciado, Roy, Timoshkov, Vadim, Hunsche, Stefan, Zhou, Xinjian, Jones, Chris, Callan, NealVolume:
9778
Year:
2016
Language:
english
DOI:
10.1117/12.2219906
File:
PDF, 1.23 MB
english, 2016