SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Polymer design in surface modification resist process for ArF lithography
Matsuo, Takahiro, Endo, Masayuki, Mori, Shigeyasu, Kuhara, Koichi, Sasago, Masaru, Shirai, Masamitsu, Tsunooka, MasahiroVolume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312340
File:
PDF, 1.56 MB
english, 1998