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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Novolak resin for ultrafast high-resolution positive i-line photoresist compositions
Rahman, M. D., Lu, Ping-Hung, Cook, Michelle M., Kim, Woo-Kyu, Khanna, Dinesh N.Volume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312347
File:
PDF, 2.41 MB
english, 1998