SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Effect of end group on novolak resin properties
Zampini, Anthony, Monaghan, Michael J., Xu, Cheng-Bai, Cardin, William J.Volume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312377
File:
PDF, 710 KB
english, 1998