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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - E-beam and deep-UV exposure of PMMA-based resists: identical or different chemical behavior?
Uhl, A., Bendig, Juergen, Leistner, J., Jagdhold, Ulrich A., Bauer, Joachim J.Volume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312404
File:
PDF, 224 KB
english, 1998