SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Inorganic bottom ARC SiOxNy for interconnection levels on 0.18-μm technology
Trouiller, Yorick, Buffet, N., Mourier, Thierry, Gobil, Yveline, Schiavone, Patrick, Quere, YvesVolume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312422
File:
PDF, 1.92 MB
english, 1998