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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Standard developer available ArF resist and performance
Uetani, Yasunori, Fujishima, Hiroaki, Miya, Yoshiko, Takemoto, IchikiVolume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312445
File:
PDF, 1.69 MB
english, 1998