SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Novolak resin analogs for resist applications
Wanat, Stan F., Jensen, Kathryn H., Lu, Ping-Hung, McKenzie, Douglas S.Volume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312450
File:
PDF, 1.14 MB
english, 1998