![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Development of DUV resist formulations with excellent performance on metal substrates
Rajaratnam, Martha M., Cameron, James F., Georger, Jr., Jacque H., Kang, Doris, Prokopowicz, Gregory P., Sinta, Roger F., Thackeray, James W.Volume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312468
File:
PDF, 1.99 MB
english, 1998