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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Performance of new high-power HVM LPP-EUV source
Panning, Eric M., Goldberg, Kenneth A., Mizoguchi, Hakaru, Nakarai, Hiroaki, Abe, Tamotsu, Nowak, Krzysztof M., Kawasuji, Yasufumi, Tanaka, Hiroshi, Watanabe, Yukio, Hori, Tsukasa, Kodama, Takeshi, ShVolume:
9776
Year:
2016
DOI:
10.1117/12.2218405
File:
PDF, 1.64 MB
2016