SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Improving material-specific dispense processes for low-defect coatings
Brakensiek, Nick, Allen, Robert D., Somervell, Mark H., Braggin, Jennifer, Berron, John, Ramirez, Raul, Anderson, Karl, Smith, BrianVolume:
7972
Year:
2011
Language:
english
DOI:
10.1117/12.879481
File:
PDF, 1.09 MB
english, 2011