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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, USA (Tuesday 11 September 2012)] Photomask Technology 2012 - Sub-20-nm node photomask cleaning enhancement by controlling zeta potential
Lin, Kuan-Wen, Abboud, Frank E., Faure, Thomas B., Lu, Chi-Lun, Shen, Chin-Wei, Hsu, Luke, Chin, Angus, Yen, AnthonyVolume:
8522
Year:
2012
Language:
english
DOI:
10.1117/12.975822
File:
PDF, 361 KB
english, 2012