Synchrotron X-ray diffraction topography study of...

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Thin Solid Films 2016 / 3

Synchrotron X-ray diffraction topography study of bonding-induced strain in silicon-on-insulator wafers

Lankinen, A., Tuomi, T.O., Kostamo, P., Jussila, H., Sintonen, S., Lipsanen, H., Tilli, M., Mäkinen, J., Danilewsky, A.N.
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Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2016.02.052
Date:
March, 2016
File:
PDF, 1.46 MB
english, 2016
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