SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Quencher distribution engineering for out-of-band insensitive EUV resists: experiments and stochastic simulation
Chien, Shang-Chieh, Naulleau, Patrick P., Chang, Shu-Hao, Wu, Jui-Ching, Chen, Jack J. H., Yen, AnthonyVolume:
8679
Year:
2013
Language:
english
DOI:
10.1117/12.2010658
File:
PDF, 791 KB
english, 2013