SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Image contrast of line-cut / contact hole features in Complementary E-Beam Lithography (CEBL)
Liu, Enden D., Tong, William M., Resnick, Douglas J., Tran, Cong, Lam, David K., Prescop, TedVolume:
8680
Year:
2013
Language:
english
DOI:
10.1117/12.2011204
File:
PDF, 841 KB
english, 2013