SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Design and simulation of illuminator with micro scanning slit array for NA 0.75 lithography system
Zhu, Linglin, Conley, Will, Zeng, Aijun, Zhang, Shanhua, Fang, Ruifang, Huang, HuijieVolume:
8683
Year:
2013
Language:
english
DOI:
10.1117/12.2011525
File:
PDF, 463 KB
english, 2013