![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - New materials and processes for directed self-assembly
Chang, Shih-wei, Tong, William M., Resnick, Douglas J., Evans, Jessica P., Ge, Shouren, Ginzburg, Valeriy V., Kramer, John W., Landes, Brian, Lee, Christopher, Meyers, Greg F., Murray, Daniel J., ParkVolume:
8680
Year:
2013
Language:
english
DOI:
10.1117/12.2011604
File:
PDF, 1.20 MB
english, 2013