SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Resist outgassing characterization based on the resist compositions and process
Sugie, Norihiko, Naulleau, Patrick P., Takahashi, Toshiya, Katayama, Kazuhiro, Takagi, Isamu, Kikuchi, Yukiko, Tanaka, Hiroyuki, Shiobara, Eishi, Inoue, SoichiVolume:
8679
Year:
2013
Language:
english
DOI:
10.1117/12.2011637
File:
PDF, 574 KB
english, 2013