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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Study of alternative capping and absorber layers for extreme ultraviolet (EUV) masks for sub-16nm half-pitch nodes
Wood, Obert R., Panning, Eric M., Rastegar, Abbas, House, Matthew, Tian, Ruahi, Laursen, Thomas, Antohe, Alin, Kearney, PatrickVolume:
9048
Year:
2014
Language:
english
DOI:
10.1117/12.2048074
File:
PDF, 4.62 MB
english, 2014