SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Organic hard masks utilizing fullerene derivatives
Wallow, Thomas I., Hohle, Christoph K., Frommhold, Andreas, Brown, Alan G., Palmer, Richard E., Lada, Tom, Robinson, Alex P.Volume:
9425
Year:
2015
Language:
english
DOI:
10.1117/12.2085675
File:
PDF, 861 KB
english, 2015