SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Experimental study of sub-DSA resolution assist features (SDRAF)
Resnick, Douglas J., Bencher, Christopher, Yi, He, Bekaert, Joost, Gronheid, Roel, Vandenberghe, Geert, Nafus, Kathleen, Wong, H.-S. P.Volume:
9423
Year:
2015
Language:
english
DOI:
10.1117/12.2085866
File:
PDF, 3.79 MB
english, 2015