![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Characterization and mitigation of relative edge placement errors (rEPE) in full-chip computational lithography
Hayashi, Naoya, Kasprowicz, Bryan S., Sturtevant, John, Gupta, Rachit, Shang, Shumay, Liubich, Vlad, Word, JamesVolume:
9635
Year:
2015
Language:
english
DOI:
10.1117/12.2196634
File:
PDF, 1.37 MB
english, 2015