SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Rule-based OPC and MPC interaction for implant layers
Hayashi, Naoya, Kasprowicz, Bryan S., Fu, Nan, Ning, Guoxiang, Werle, Florian, Roling, Stefan, Hecker, Sandra, Ackmann, Paul, Buergel, ChristianVolume:
9635
Year:
2015
Language:
english
DOI:
10.1117/12.2197195
File:
PDF, 691 KB
english, 2015