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SPIE Proceedings [SPIE Photomask Japan 2015 - Yokohama, Japan (Monday 20 April 2015)] Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII - Development of new high transmission eaPSM for Negative Tone Development process on wafer
Yoshioka, Nobuyuki, Adachi, Takashi, Tani, Ayako, Fujimura, Yukihiro, Yoshikawa, Shingo, Hayano, Katsuya, Morikawa, Yasutaka, Miura, Yoichi, Miyashita, HiroyukiVolume:
9658
Year:
2015
Language:
english
DOI:
10.1117/12.2197611
File:
PDF, 1012 KB
english, 2015