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SPIE Proceedings [SPIE Photomask Japan 2015 - Yokohama, Japan (Monday 20 April 2015)] Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII - Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging
Yoshioka, Nobuyuki, Mangat, Pawitter, Verduijn, Erik, Wood, Obert R., Benk, Markus P., Wojdyla, Antoine, Goldberg, Kenneth A.Volume:
9658
Year:
2015
Language:
english
DOI:
10.1117/12.2201048
File:
PDF, 1023 KB
english, 2015