SPIE Proceedings [SPIE SPIE Photomask Technology -...

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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Ruthenium capping layer preservation for 100X clean through pH driven effects

Hayashi, Naoya, Kasprowicz, Bryan S., Dattilo, Davide, Dietze, Uwe, Hsu, Jyh-Wei
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Volume:
9635
Year:
2015
Language:
english
DOI:
10.1117/12.2202188
File:
PDF, 1.94 MB
english, 2015
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