SPIE Proceedings [SPIE SPIE Photomask Technology -...

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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Improvement in accuracy of defect size measurement by automatic defect classification

Hayashi, Naoya, Kasprowicz, Bryan S., Samir, Bhamidipati, Pereira, Mark, Paninjath, Sankaranarayanan, Jeon, Chan-Uk, Chung, Dong-Hoon, Yoon, Gi-Sung, Jung, Hong-Yul
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Volume:
9635
Year:
2015
Language:
english
DOI:
10.1117/12.2202511
File:
PDF, 717 KB
english, 2015
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