![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Scatterometry modeling for gratings with roughness and irregularities
Sanchez, Martha I., Ukraintsev, Vladimir A., Bischoff, Joerg, Hehl, KarlVolume:
9778
Year:
2016
Language:
english
DOI:
10.1117/12.2219019
File:
PDF, 789 KB
english, 2016