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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Dry etching resistance of methacrylate polymers for ArF excimer laser lithography
Ohfuji, Takeshi, Endo, Masayuki, Takahashi, Makoto, Naito, Takuya, Tatsumi, Tetsuya, Kuhara, Koichi, Sasago, MasaruVolume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312363
File:
PDF, 223 KB
english, 1998