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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Extension of 248-nm optical lithography: a thin film imaging approach
Lin, Qinghuang, Katnani, Ahmad D., Brunner, Timothy A., DeWan, Charlotte, Fairchok, Cindy, LaTulipe, Douglas C., Simons, John P., Petrillo, Karen E., Babich, Katherina, Seeger, David E., Angelopoulos,Volume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312417
File:
PDF, 3.19 MB
english, 1998