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SPIE Proceedings [SPIE Optical Systems Design 2005 - Jena, Germany (Monday 12 September 2005)] Optical Fabrication, Testing, and Metrology II - Near-field holography with a two-dimensional phase mask for fabrication of two-dimensional structures in a single exposure step
Hartung, H., Clausnitzer, T., Kley, E.-B., Tünnermann, A.Volume:
5965
Year:
2005
Language:
english
DOI:
10.1117/12.625105
File:
PDF, 913 KB
english, 2005