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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Performance of EUV molecular resists based on fullerene derivatives
Oizumi, Hiroaki, Allen, Robert D., Somervell, Mark H., Matsunaga, Kentaro, Kaneyama, Koji, Santillan, Julius Joseph, Shiraishi, Gousuke, Itani, ToshiroVolume:
7972
Year:
2011
Language:
english
DOI:
10.1117/12.879302
File:
PDF, 9.78 MB
english, 2011