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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Bound PAG resists: an EUV and electron beam lithography performance comparison of fluoropolymers
Bozano, Luisa D., Allen, Robert D., Somervell, Mark H., Brock, Phillip J., Truong, Hoa D., Sanchez, Martha I., Wallraff, Gregory M., Hinsberg, William D., Allen, Robert D., Fujiwara, Masaki, Maeda, KaVolume:
7972
Year:
2011
Language:
english
DOI:
10.1117/12.884519
File:
PDF, 3.11 MB
english, 2011