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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, USA (Tuesday 11 September 2012)] Photomask Technology 2012 - Electron beam inspection of 16nm HP node EUV masks
Shimomura, Takeya, Abboud, Frank E., Faure, Thomas B., Narukawa, Shogo, Abe, Tsukasa, Takikawa, Tadahiko, Hayashi, Naoya, Wang, Fei, Ma, Long, Lin, Chia-Wen, Zhao, Yan, Kuan, Chiyan, Jau, JackVolume:
8522
Year:
2012
Language:
english
DOI:
10.1117/12.976017
File:
PDF, 397 KB
english, 2012