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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, USA (Tuesday 11 September 2012)] Photomask Technology 2012 - Correcting image placement errors using registration control (RegC®) technology in the photomask periphery
Cohen, Avi, Abboud, Frank E., Faure, Thomas B., Lange, Falk, Ben-Zvi, Guy, Dmitriev, Vladimir, Graitzer, ErezVolume:
8522
Year:
2012
Language:
english
DOI:
10.1117/12.980258
File:
PDF, 376 KB
english, 2012