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Mass-selected ion beam study on etching characteristics of ZnO by methane-based plasma
Li, Hu, Karahashi, Kazuhiro, Fukasawa, Masanaga, Nagahata, Kazunori, Tatsumi, Tetsuya, Hamaguchi, SatoshiVolume:
55
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.55.021202
Date:
February, 2016
File:
PDF, 1.35 MB
english, 2016