[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - Ultra-shallow 28-88 nm n/sup +//p junction formation using PH/sub 3/ and AsH/sub 3/ plasma immersion ion implantation
Yang, B.L., Cheung, N.W., Denholm, S., Jiqun Shao,Volume:
2
Year:
1998
Language:
english
DOI:
10.1109/iit.1998.813890
File:
PDF, 345 KB
english, 1998