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Highly sensitive self-developing soft X-ray resists of silicon-containing aldehyde copolymers and sensitive novolac-based composite resists containing aldehyde copolymer
Kazuo Nate, Takashi Inoue, Hitoshi Yokono, Koichi HatadaVolume:
35
Year:
1988
Language:
english
Pages:
9
DOI:
10.1002/app.1988.070350407
File:
PDF, 455 KB
english, 1988