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[IEEE 2015 Symposium on VLSI Technology - Kyoto, Japan (2015.6.16-2015.6.18)] 2015 Symposium on VLSI Technology (VLSI Technology) - Improved electromigration-resistance of Cu interconnects by graphene-based capping layer
Yoon, Seong Jun, Yoon, Alexander, Hwang, Wan Sik, Choi, Sung-Yool, Cho, Byung JinYear:
2015
Language:
english
DOI:
10.1109/vlsit.2015.7223714
File:
PDF, 811 KB
english, 2015