SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Study of Gd/Tb LPP emission near λ = 6.7nm for beyond EUV lithography
Panning, Eric M., Goldberg, Kenneth A., Yin, Liang, Wang, Hanchen, Reagan, Brendan, Baumgarten, Cory, Shlyaptsev, Vyacheslav, Gullikson, Eric, Rocca, JorgeVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2219840
File:
PDF, 526 KB
english, 2016