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[IEEE 2015 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2015.3.15-2015.3.16)] 2015 China Semiconductor Technology International Conference - Application of stress reversal of metal hardmask for 20nm and beyond
Zhou Jun,, Bao Yu,, Gao Lin,, Zhang Liang,, Sun Lei,, Zhou Haifeng,, Fang Jingxun,Year:
2015
Language:
english
DOI:
10.1109/cstic.2015.7153414
File:
PDF, 720 KB
english, 2015