[IEEE Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004. - Osaka, Japan (2004.10.26-2004.10.29)] Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004. - Contrast improvement by top-antireflective coatings for high numerical aperture 157nm-lithography

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