Three-dimensional photolithography simulation

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Journal of Technology Computer Aided Design TCAD 1996

Three-dimensional photolithography simulation

Kirchauer, Heinrich, Selberherr, Siegfried
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Year:
1996
Language:
english
Journal:
Journal of Technology Computer Aided Design TCAD
DOI:
10.1109/tcad.1996.6449163
File:
PDF, 7.43 MB
english, 1996
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